ASML to launch first High NA EUV microimage exposure equipment by the end of the year as planned
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Update time : 2023-09-09 10:40:45
Dutch semiconductor equipment maker ASML CEO Peter Wennink said that despite some supplier obstacles, but the end of the year will be on schedule to launch the first product of the next generation product line.
High numerical aperture (High NA) EUV micrographic exposure equipment is only the size of a truck, but the cost of more than 300 million euros per unit (about NT $ 10.2 billion). Like cameras, High NA EUV micrographic exposure equipment will collect light from a wider angle and improve resolution by 70%. This equipment is essential for leading semiconductor manufacturers to produce advanced semiconductor wafers, with smaller area and better performance wafers within a decade.
ASML is Europe's largest semiconductor equipment vendor and dominates the market for micrographic exposure equipment, which is a key step in semiconductor manufacturing, but for high numerical aperture (High NA) EUVs, Peter Wennink says some suppliers are experiencing difficulties in ramping up production capacity and delivering the right technology, which is causing delays. But even so, the first products will be launched at the end of the year.
Only TSMC, Intel, Samsung, SK Hynix and Micron use ASML products. EUV micrographic exposure equipment currently costs more than US$200 million (about NT$6.4 billion) per set. Under pressure from the United States, the Dutch government has denied ASML a license to export EUV micrographic exposure equipment to Chinese wafer makers, creating a bottleneck in China's push for advanced semiconductor processes.
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