Samsung's first introduction of local production of photoresists
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Update time : 2022-12-07 09:51:00
According to media reports, Samsung Electronics recently introduced into its mass production line the extreme ultraviolet (EUV) photoresist developed by local company Dongjin Shimeiken Semiconductor for high-tech processes, it is reported that this is Samsung's first attempt at local mass production of photoresist, previously, South Korea's photoresist demand is highly dependent on Japan and imported from other countries.
Public information shows that photoresist is a key material in the photolithography process, refers to the UV, deep UV, electron beam, ion beam, X-ray and other light or radiation, the solubility of the change in the etching-resistant thin film materials, mainly used in discrete circuits and discrete devices for the processing of fine graphics. Media sources show that the photoresist of Dongjin Shimaken Semiconductor passed the reliability test of Samsung Electronics last year and was applied to the mass production line less than a year ago. At present, in addition to Dongjin Shimaken, local Korean companies Yongchang Chemical and SK Material Performance are also developing photoresists, but they have not yet reached the level of reliability verification. The photoresist industry has extremely high industry barriers. First of all, it requires high requirements for raw materials such as resin and photoreceptor, and has high production technology barriers, which require long-term technology accumulation of companies in both R&D and mass production. In addition, photoresist manufacturers need to purchase a photolithography machine for internal formulation testing before sending samples of their products, and adjust the formulation according to the verification results. According to the different exposure wavelengths, photoresists can be divided into five categories: g-line, i-line, KrF, ArF and EUV photoresists, of which g-line and i-line are generally used for processes above 250nm, KrF, ArF and EUV photoresists are high-end photoresists, KrF is generally used for 250nm-130nm processes, ArF is generally used for 130nm-14nm processes, EUV KrF is generally used for 250nm-130nm process, ArF is generally used for 130nm-14nm process and EUV is mainly used for 7nm and below process.
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